College of Arts and Science - where great minds meet


The work of the processing group has been highlighted in the following articles and proceedings.

Jump to selected year: 2006 2005 2004 2003 2002


M.P. Bradley and J.T. Steenkamp, “Time-resolved Ion and Electron Current Measurements in Pulsed Plasma Sheaths,” IEEE Trans. Plasma Science 34, 1156-1159 (2006).

X. Lu, Q. Yang, W. Chen, C. Xiao, A. Hirose, “Field electron emission characteristics of diamond films with different grain morphologies,” Journal of Vacuum Science and Technology B (in press)

C. Xiao, S. J. Livingstone, A. K. Singh, D. Raju, G. St. Germaine, D. Liu, C. Boucher, A. Hirose, “Short Wavelength Density and Low Frequency MHD Fluctuation Measurements in the STOR-M Tokamak,” IAEA Fusion Energy 2006, Paper No. EX/P4-31.

Y.S. Li, S. Shimada, H. Kiyono, X. Lu and A. Hirose, “Mechanical and field emission properties of CGedSi(C, N) films synthesized by PECVD from HMDS precursors,” Diamond and Related Materials (in press).

Y.S. Li, S. Shimada, and A. Hirose, “Synthesis of Al2O3-SiO2 films by Ar/O2 plasma enhanced CVD from alkoxide precursors,” Chemical Vapor Deposition (In press).

Q. Yang, S.N. Yang, C. Xiao, and A. Hirose, “Transformation of carbon nanotubes to diamond in microwave hydrogen plasma,” Material Letters (in press).

W. Chen, X. Lu, Q. Yang, C. Xiao, R. Sammynaiken, J. Manly, and A. Hirose, “Effects of gas flow rate on diamond deposition in a microwave plasma reactor,” Thin Solid Films (in press).

X. Lu, Q. Yang, C. Xiao, and A. Hirose, “Nonlinear Fowler-Nordheim plots of the field electron emission from graphitic nanocones: influence of nonuniform field enhancement factors,” Journal of Physics D: Applied Physics 39, 3375-3379 (2006).

W. Chen, C. Xiao, Q. Yang, S. Yang, and A. Hirose, “Controlled synthesis of tungsten and tungsten oxide nanorod films,” Materials Research Innovations 10, 169-178 (2006).

X. Lu, Q. Yang, C. Xiao, and A. Hirose, “Field electron emission of carbon-based nanocone films,” Applied Physics A - Materials and Processing 82, 293-296 (2006).

Q. Yang, T. Hamilton, C. Xiao, A. Hirose, and A. Moewes, “Plasma-enhanced synthesis of diamond nanocone films,” Thin Solid Films 494, 110-115 (2006).

Q. Yang, T. Senda, and A. Hirose, “Sliding wear behavior of WC-12%Co coatings at elevated temperatures,” Surface and Coatings Technology 200, 4208-4212 (2006).


Q. Yang, W. Chen, C. Xiao, A. Hirose, and R. Sammynaiken, “Simultaneous Growth of Well-aligned Diamond and Graphitic Carbon Nanostructures through Graphite Etching,” Diamond and Related Materials 14, 1683-1687 (2005).

W. Chen, C. Xiao, Q. Yang, A. Moewes, and A. Hirose, “The effects of bias polarity on diamond deposition by hot-filament chemical vapor deposition,” Canadian Journal of Physics 83, 753-759 (2005).

Q. Yang, W. Chen, C. Xiao, A. Hirose, and M. Bradley, “Low temperature synthesis of diamond thin films through graphite etching in a microwave hydrogen plasma,” Carbon 43, 2635-2638 (2005).

Q. Yang, C.J. Xiao, and A. Hirose, “Plasma enhanced deposition of nano-structured carbon films,” Plasma Science and Technology 7, 2660-2664 (2005).

Q. Yang, W. Chen, C. Xiao, R. Sammynaiken, and A. Hirose, “Synthesis of diamond films and nanotips through graphite etching,” Carbon 43, 748-754 (2005).


B. Waduwawwatte, B.C. Si, and C.J. Xiao, “Water Conduction Porosity from Tension Infiltrometer Measurements,” Soil Sci. Society of Am. J. 68, 760-769 (2004).

Q. Yang, T. Senda, N. Kotani , and A. Hirose, “Sliding Wear Behavior and Tribofilm Formation of Ceramics at High Temperatures,” Surface and Coatings Technology 184, 270-277 (2004).

A. Hirose, H. Li, S. Livingstone, and X.F. Lu, “On diffraction of electromagnetic waves by an aperture in a conducting screen,” Canadian Journal of Physics 82, 495-500 (2004).

V.N. Vasilets, A. Hirose, Q. Yang, A. Singh, R. Sammynaiken, M. Foursa, and Y.M. Shulga, “Characterization of doped diamond-like carbon films deposited by hot wire plasma sputtering of graphite,” Applied Physics A 79, 2079-2084 (2004).

V.N. Vasilets, A. Hirose, Q. Yang, A. Singh, R. Sammynaiken, Yu.M. Shulga, A.V. Kuznetsov, and V.I. Sevastianov, “Hot wire plasma deposition of doped DLC films on fluorocarbon polymers for biomedical applications,” in Plasma Processes and Polymers, Chapter 5, Plasma Deposition of Thin Films, edited by R. d’Agostino, P. Favia, C. Oehr, and M. R, Wertheimer, (Wiley-VCH, Verlag GmbH & Co. KGaA, Weinheim, Germany, 2005), p. 65.

Q. Yang, C. Xiao, W. Chen, and A. Hirose, “Selective growth of diamond and carbon nanostructures by hot filament chemical vapor deposition,” Diamond and Related Materials 13, 433-437 (2004).


S. Qin, M.P. Bradley, P.L. Kellerman, “Faraday Dosimetry Characteristics of PIII Doping Processes,” IEEE Transactions on Plasma Science 31, 369-376 (2003).

Q. Yang, C. Xiao, W. Chen, A. K. Singh, T. Asai and A. Hirose, “Growth mechanism and orientation control of well-aligned carbon nanotubes,” Diamond and Related Materials 12, 1482-1487 (2003).

A. V. Sokolov, E. Z. Kurmaev, S. Leitch, A. Moewes, J. Kortus, L. D. Finkelstein, N. A. Skorikov, C. Xiao, and A. Hirose, “Band dispersion of MgB2, graphite and diamond from resonant inelastic scattering,” Journal of Physics-Condensed Matter 15, 2081-2089 (2003).


M.P. Bradley, “High Voltage Breakdown in Vacuum: Physical Mechanisms and Engineering Design Rules,” Axcelis Technologies Internal Engineering Design Guideline (2002).

S. Qin, M.P. Bradley, P.L. Kellerman, K. Saadatmand, “Measurements of secondary electron emission and plasma density enhancement for plasma exposed surfaces using an optically isolated Faraday cup,” Rev. Sci. Inst. 73, 1153-1156 (2002).

P.L. Kellerman, V. Benveniste, M.P. Bradley, K. Saadatmand, “Particle trapping and annihilation within the extraction system of ion sources,” Rev. Sci. Inst. 73, 834-836 (2002).

P.L. Kellerman, S. Qin, M.P. Bradley, K. Saadatmand, “Ion depletion effects in sheath dynamics during plasma immersion ion implantation- models and data,” Rev. Sci. Inst. 73, 837-839 (2002).

S. Qin, M.P. Bradley, P.L. Kellerman, K. Saadatmand, “Measurement and analysis of deposition-etch characteristics of BF3 plasma immersion ion implantation,” Rev. Sci. Inst. 73, 840-842 (2002).

P.L. Kellerman, M.P. Bradley, and S. Qin, “Active Charge Control in PIII- enlarging the process space,” Surface and Coatings Technology 156, 77-82 (2002).

Magnetic Processing